• The proposed processing-in-memory macro is a monolithic, low-power, high-density analog PIM solution fabricated in 28 nm CMOS technology. It features a 4T1C dual-port DRAM cell (DPC) that physically separates the refresh and MAC (multiply-and-accumulate) ports, enabling simultaneous refresh and computation (SMR)—a breakthrough that addresses the refresh bottleneck of prior DRAM-PIM designs. This dual-port structure allows the refresh cycle to proceed independently without stalling MAC operations, significantly improving throughput by 27.5%.
The cell is designed with both MOS and MOM capacitors to ensure sufficient data retention time (DRT), while the refresh logic uses a dedicated read bitline and write bitline for non-destructive restoration.
Feature
· • Retention time: ≈ 200 us
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• Area: 0.268um2
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• Array size: 72Kb
Application
· • Samsung 28nm CMOS process based 4T1C DRAM cell for DRAM-PIM macro
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• DRAM-PIM macro achieves 9.29 T
Business Area
DRAM memory system
Category
Memory & Logic Library > Embedded Memories
Tech Specs
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IP Name :
DRAM PIM cell & Array
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Provider :
정성욱 교수님, 김도한
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Foundry :
SAMSUNG
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Technology :
28nm
Deliverables
· Schematic netlist & GDS
Validation Status
· Chip measured
Availability
Samsung 28nm Only